Features
- The system comes standard with a cassette chamber and can be used as
- production-scale system with the addition of an aligner mechanism.
- Additional etching chambers and ashing chambers can be equipped.
- Compared to the ICP method, the NLD generates plasma with lower pressure, higher density, and lower electron temperature,
- enabling the processing of materials such as quartz, glass, crystal, LN, and LT substrates.
- Chamber maintenance is simple and efficient.
- A wide range of process solutions is available, from mask etching to etching of quartz and glass.
Applications
- Optical Devices (diffraction grating, waveguide, amplifier, optical switch etc.)
- Microlens
- Photonics
- μ-TAS
