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NE-550EXa
NE-550EXa is a multipurpose high-density plasma etching system, especially for test facilities such as universities and government agencies.
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NE-5700
Dry etching system for high volume production with good cost performance and wide selection of tool configuration.
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NE-950EX APIOS
NE-950EX Dry Etching high throughput system, designed for the LED market.
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ENVIRO-1Xa
Advanced plasma resist strip system specifically designed for non-300mm fabs. Equipped with a versatile platform that can handle the complete line of wafer sizes from 4" to 8"
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SME Series
The SME series deposition system is capable of handling up to 200mm substrate size and is available in several configurations from single to six process chambers.
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SIV Series
Vertical Deposition results in low particle generation.
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CS-200
The CS-200 is a compact load-lock type sputtering system. suitable for research & development and for small and medium-scale production.
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