The Industry's Most Advanced Ashing System
The ENVIRO-1Xa resist strip system provides the highest throughput per square meter of cleanroom space at the lowest cost. ENVIRO-1Xa features a new remote plasma source achieving extremely quick resist removal rates of >10µm/min. ENVIRO-1Xa is the smallest 200mm resist strip system which offers a single load-port on the market. With less cleanroom space required, and lower price than competitor's models, this resist strip system delivers the lowest CoO, which is achieved by providing high throughput at lower total system cost. The ENVIRO-1Xa is ideal for all resist strip work including difficult to strip resists, like SU-8, residue removal, and surface preparation applications.
Key Features
- 70 WPH (20 sec process time)
- 100 – 200 mm wafer sizes
- Non-contact end effector option
- HEPA option
- Dual cassette loading:
- SMIF option
ENVIRO-1Xa offers flexibility for multiple applications
- Descum
- Thick resist strip (including: SU-8, KMPR, silanated)
- Polymer and residue removal
- MEMS Release (organic sacrificial layer removal)
- Backside clean (bevel/edge)
ENVIRO offers a wide process operating range
- Ashing Rate – Several nm/min to more than 10um/min
- Wide range of stage temperature control (hot plate or optional cold plate)
- High efficiency downstream plasma source
- Up to 4 MFC’s, 2 standard, 2 optional
- Gas chemistries: various, including halogen bearing
Need more information?
At ULVAC, we understand that finding the right product is crucial for optimizing your processes, whether you're scaling up production or maintaining precision in your systems. With our wide range of cutting-edge vacuum technologies and in-depth expertise, we will guide you through selecting the ideal solution tailored to your unique requirements.
Contact ULVAC System Sales & Support For inquiries outside North and South America, please contact ULVAC Corporate
